Articles | Volume 9, issue 2
https://doi.org/10.5194/jsss-9-209-2020
https://doi.org/10.5194/jsss-9-209-2020
Regular research article
 | 
16 Jul 2020
Regular research article |  | 16 Jul 2020

Analysis of photoelastic properties of monocrystalline silicon

Markus Stoehr, Gerald Gerlach, Thomas Härtling, and Stephan Schoenfelder

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Cited articles

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Short summary
Photoelasticity is considered a useful measurement tool for non-destructive and contactless determination of mechanical stresses or strains in the production of silicon wafers. In this work, a detailed derivation for the anisotropic stress-optic law is presented, and the corresponding stress-optical parameters are measured.